Booth No.: H 33
CFMEE (listed in Shanghai Stock Exchange Market 688630) was established in June 2015 and located in the integrated circuit industry park of Hefei High-Tech Zone, China. The main products and services of CFMEE are direct writing lithography equipment and automation systems for the pan-semiconductor industry, direct imaging equipment for the PCB industry, solder mask imaging equipment, automation systems and other laser direct imaging equipment for other applications. CFMEE has a broaden customer base in South China, Central China, East China, Taiwan, and overseas markets, and has 4 service offices in Shenzhen, Suzhou, Taiwan, and Jiangxi cities. All offices are equipped with spare parts warehouses.
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MAS 10 / 12 / 15 Series
Applied in HDI, SLP and others
Minimal Line/Space: 10/10μm
Registration accuracy: ±7μm
Throughput up to 360 panels/hour (one line)
NEX 40 / 50 / 60 Series
Matured Multi-wavelength technology
Applied for several colors of solder mask, including white
Minimal 40μm DAM and 60μm SRO
Registration accuracy: ±10μm
Throughput up to 300 panels/hour (one line, dual table)
RTR 8/12/15/25/25L Series
Single roll or dual roll can be selected
Applied for Roll to Roll production
Minimal Line/Space: 8/8μm
Registration accuracy: ±8μm
Throughput up to 4.0 meters/minute
Roll width: 260mm/520mm